Avoiding Patent Exhaustion: Keeping your patents vital after Lexmark and Helferich

Date: March 22, 2016

Time: 8:00–10:00 a.m.

Location: Nixon Peabody LLP, 2 Palo Alto Square, 3000 El Camino Real, Suite 500, Palo Alto, CA 94306

In this session, we will explore the implications of the recent Federal Circuit’s Lexmark International v. Impression Products and last year’s Helferich Patent Licensing v. New York Times. We will discuss practical steps patent holders can take to protect their patent rights.

Join us for a complimentary breakfast and interactive discussion on:

  • How to clearly communicate post-sale restrictions
  • Special restrictions needed for licensees
  • Best practices for imported products
  • Other unintended claims

Plus, we will kick off the program with a brief update on IP legal developments.

Our Speakers

  • Jennifer Hayes, Partner
  • Robert Krebs, Partner
  • Maria Swiatek, Partner


8:00 a.m. Breakfast and networking
8:30–10:00 a.m. Presentation and Q&A

Continuing Education

This course is eligible for 1.5 General CLE credits. See details here.
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